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  • HPL to Appeal Exhaustion Order

    On August 14, 2013, Helferich Patent Licensing, LLC’s patent infringement litigation in the District Court for the Northern District of Illinois was dismissed on the basis of a summary judgment ruling by the Court under the doctrine of patent exhaustion.   Helferich is disappointed in the ruling, which it continues to believe is an unwarranted extension of the exhaustion doctrine.  Helferich is concerned that, if generally accepted, the court's reasoning on exhaustion would severely devalue American intellectual property, particularly for companies having significant patent portfolios that include pioneering patents.  Helferich intends to appeal the Court's decision.  Helferich is the exclusive licensee of more than 50 patents worldwide that have been licensed by more than 200 of the world’s most advanced companies.